发明名称 |
Non-volatile memory and fabrication method thereof |
摘要 |
The present invention relates to a non-volatile memory comprising: a first electrode ( 11 ); a second electrode ( 12 ); and a phase-change recording medium ( 14 ) sandwiched between the first electrode ( 11 ) and the second electrode ( 12 ), in which resistance value is varied by applying an electrical pulse across the first electrode ( 11 ) and the second electrode ( 12 ), at least one of the first electrode ( 11 ) and the second electrode ( 12 ) contains as a main ingredient at least one member selected from the group consisting of ruthenium, rhodium and osmium, and the phase-change recording medium ( 14 ) is formed of a phase-change material that contains chalcogen(s). This non-volatile memory exhibits improved durability and reliability by preventing deterioration of property (i.e., mutual impurity diffusion between the electrode and the phase-change recording medium) caused by application of current.
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申请公布号 |
US7023014(B2) |
申请公布日期 |
2006.04.04 |
申请号 |
US20030716621 |
申请日期 |
2003.11.20 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
MORIMOTO KIYOSHI;TANAKA HIDEYUKI;OHTSUKA TAKASHI;MIYAMOTO AKIHITO |
分类号 |
H01L29/18;G11C16/02;H01L27/08;H01L45/00 |
主分类号 |
H01L29/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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