发明名称 Non-volatile memory and fabrication method thereof
摘要 The present invention relates to a non-volatile memory comprising: a first electrode ( 11 ); a second electrode ( 12 ); and a phase-change recording medium ( 14 ) sandwiched between the first electrode ( 11 ) and the second electrode ( 12 ), in which resistance value is varied by applying an electrical pulse across the first electrode ( 11 ) and the second electrode ( 12 ), at least one of the first electrode ( 11 ) and the second electrode ( 12 ) contains as a main ingredient at least one member selected from the group consisting of ruthenium, rhodium and osmium, and the phase-change recording medium ( 14 ) is formed of a phase-change material that contains chalcogen(s). This non-volatile memory exhibits improved durability and reliability by preventing deterioration of property (i.e., mutual impurity diffusion between the electrode and the phase-change recording medium) caused by application of current.
申请公布号 US7023014(B2) 申请公布日期 2006.04.04
申请号 US20030716621 申请日期 2003.11.20
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 MORIMOTO KIYOSHI;TANAKA HIDEYUKI;OHTSUKA TAKASHI;MIYAMOTO AKIHITO
分类号 H01L29/18;G11C16/02;H01L27/08;H01L45/00 主分类号 H01L29/18
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