发明名称 Method for creating patterns for producing integrated circuits
摘要 To increase the writing speed of masks, context information can be used to distinguish the attributes of portions of the mask that are critical from attributes, and portions, that are less critical. By using this information, which may be derived from the design context of the features, the mask can be written at a higher speed without sacrificing the accuracy of the important attributes or features.
申请公布号 US7024638(B2) 申请公布日期 2006.04.04
申请号 US20030621114 申请日期 2003.07.14
申请人 CADENCE DESIGN SYSTEMS, INC. 发明人 SCHEFFER LOUIS K.;YOSHIDA KENJI;ABE YOSHIKUNI;FUJIMURA AKI;PACK ROBERT C.
分类号 G03F7/20;G06F17/50;G06F9/45;G06F9/455;H01L21/027 主分类号 G03F7/20
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