发明名称 PVD method and PVD apparatus
摘要 A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.
申请公布号 US7022209(B2) 申请公布日期 2006.04.04
申请号 US20030620570 申请日期 2003.07.16
申请人 INFINEON TECHNOLOGIES AG 发明人 SABISCH WINFRIED;KERSCH ALFRED;SCHULZE-ICKING GEORG;WITKE THOMAS;ZEDLITZ RALF
分类号 C23C14/35;H01J37/34 主分类号 C23C14/35
代理机构 代理人
主权项
地址