发明名称 Conditioning of a reaction chamber
摘要 A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber and the environment is regulated to form the polymer on the interior surface of the chamber. Methods for the manufacture of integrated circuits, electronic devices, and electronic systems, are also provided.
申请公布号 US7022620(B2) 申请公布日期 2006.04.04
申请号 US20030716135 申请日期 2003.11.18
申请人 MICRON TECHNOLOGY, INC. 发明人 POLINSKY WILLIAM A.;CRANE BILL;GONZALES JOHN C.;OTT STEVEN
分类号 H01L21/461;B44C1/22;H01L21/302;H01L21/311 主分类号 H01L21/461
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