发明名称 SUBSTRATE HOLDING STRUCTURE AND SUBSTRATE PROCESSING DEVICE
摘要 An object of the invention is to suppress thermal stress breakage of a substrate holding platform in a substrate holding structure for holding a processing subject substrate. In a board holding structure provided with a board holding platform at the front end of a pillar, a joining section between the pillar and the substrate holding platform is formed with a flange defined by the inner and outer peripheral surfaces, in which case the inner peripheral surface is formed of an inclined surface in which the inner diameter of the flange continuously increases toward the lower surface of the substrate holding platform. Further, the lower surface of the substrate holding platform to which the flange is joined is formed with a U-shaped groove corresponding to the outer peripheral surface of the flange.
申请公布号 KR20060028820(A) 申请公布日期 2006.04.03
申请号 KR20067003232 申请日期 2006.02.16
申请人 TOKYO ELECTRON LIMITED;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 TANAKA SUMI;SAITO TETSUYA;NATSUHARA MASUHIRO;NAKATA HIROHIKO
分类号 H01L21/02;H01L21/00;H01L21/687 主分类号 H01L21/02
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