| 摘要 |
The present invention provides a substrate treatment device which can detect the defect coating of the substrate in the early stage. A carrying stage 3 is installed in the coating unit 14 of the substrate treatment device, it has: a holding plane 30 to carry the rectangular substrate 90; a bridge structure 4 installed above the holding plane 30 about horizontally; a photographing part 23 to take the picture of the surface of substrate 90. A nozzle support part 40 is disposed on the bridge structure 4. It has a slit nozzle to spurt the photoresist, so as to scan the surface of substrate 90 by the slit nozzle, and to coat the photoresist at the same time. When coating the photoresist is terminated, the photographing part 23 takes the picture of the surface of the substrate 90, and transfers the image data to the determination part 24. The determination part 24 proceeds the image recognition process onto the image data, and determines the coating condition depending on whether the substrate 90 generates defect coating such as exposed white spots, etc. or not. |
