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发明名称
防护胶膜框架及利用此框架之微影用防护胶膜组件
摘要
本发明提供一种防护胶膜框架,其能有效防止防护胶膜膜片与接着层的受损以及粒子的产生,并能对初缩光罩平均地加压。本发明之防护胶膜框架1,系为一微影用防护胶膜膜用的防护胶膜框架,具有上端面与下端面,于其上端面贴附防护胶膜膜片,而其下端面贴附于初缩光罩。在该框架的上端面的全周或一部分形成凹槽2、凸起或梯级部,于该凹槽、凸起或梯级部之内侧介由接着层设置有用以贴附防护胶膜膜片的区域3;于前述凹槽、凸起或梯级部之外侧设置有用以将该框架朝向初缩光罩加压的区域4。
申请公布号
TW200611071
申请公布日期
2006.04.01
申请号
TW094112295
申请日期
2005.04.18
申请人
信越化学工业股份有限公司
发明人
滨田裕一
分类号
G03F1/14;H01L21/027
主分类号
G03F1/14
代理机构
代理人
周良谋;周良吉
主权项
地址
日本
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