形成二氧化矽系被膜用涂布液,申请号TW094121483-传众专利搜索

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发明名称	形成二氧化矽系被膜用涂布液
摘要	本发明系提供一种可无空隙地埋入微小空间之形成二氧化矽系被膜用涂布液。此涂布液为含有矽氧烷聚合物与溶剂之形成二氧化矽系被膜用涂布液者，该溶剂为含有n–丁醇及甲基–3–甲氧基丙酸酯。094121483-p01.bmp
申请公布号	TW200610787	申请公布日期	2006.04.01
申请号	TW094121483	申请日期	2005.06.27
申请人	东京应化工业股份有限公司	发明人	高滨昌;佐藤功
分类号	C08L83/04;C08G77/06;H01L21/027	主分类号	C08L83/04
代理机构		代理人	林志刚
主权项
地址	日本

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