发明名称 Method And Apparatus For Performing Rule-Based Gate Shrink Utilizing Dipole Illumination
摘要 A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gates features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination. <IMAGE>
申请公布号 KR100566153(B1) 申请公布日期 2006.03.31
申请号 KR20030018562 申请日期 2003.03.25
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分类号 H01L21/027;G03F1/00;G03F1/36;G03F7/20 主分类号 H01L21/027
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