发明名称 ROTATING SHUTTER FOR LASER-PRODUCED PLASMA DEBRIS MITIGATION
摘要 A laser produced plasma device comprises a shutter assembly for mitigating the contaminating effects of debris generated by the plasma. In one embodiment, the shutter assembly includes a rotatable shutter having at least one aperture that provides a line-of-sight between a radiation source and an exit of the device during a first period of rotation of the shutter, and obstructs the line-of-sight between the radiation source and the exit during a second period of rotation. The shutter assembly in this embodiment also includes a motor configured to rotate the shutter to permit passage of the X-rays through the at least one aperture during the first period of rotation, and to thereafter rotate the shutter to obstruct passage of the debris through the at least one aperture during the second period of rotation.
申请公布号 US2006067476(A1) 申请公布日期 2006.03.30
申请号 US20050161237 申请日期 2005.07.27
申请人 JMAR RESEARCH, INC. 发明人 BLOOM SCOTT H.;RIEGER HARRY;ALWAN JAMES J.
分类号 H05G2/00;G21G4/00;H01J35/00 主分类号 H05G2/00
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