发明名称 METHOD OF FABRICATING CAPACITOR
摘要 A method of fabricating a capacitor is described. A dielectric layer is formed over a substrate. An upper electrode having multiple openings therein is formed over the dielectric layer. Then, a doping step is performed to the substrate through the openings to form a single doped region as a lower electrode in the substrate under the upper electrode.
申请公布号 US2006068559(A1) 申请公布日期 2006.03.30
申请号 US20040711533 申请日期 2004.09.24
申请人 GAU JING-HORNG 发明人 GAU JING-HORNG
分类号 H01L21/20;H01L21/44 主分类号 H01L21/20
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