Ultratough CVD single crystal diamond and three dimensional growth thereof

摘要

The invention relates to a single-crystal diamond grown by microwave plasma chemical vapor deposition that has a toughness of at least about 30 MPa m^1/2. The invention also relates to a method of producing a single-crystal diamond with a toughness of at least about 30 MPa m^1/2. The invetnion further relates to a process for producing a single crystal CVD diamond in three dimensions on a single crystal diamond substrate.