| 摘要 |
Semiconductor device manufacturing equipment includes a plurality of process chambers in which one or more fabrication processes takes place, a transfer chamber selectively communicating with the process chambers by means of doors, a vacuum pump and a source of vent gas which are connected to the transfer chamber via vacuum/vent lines to regulate the (vacuum) pressure in the transfer chamber, and a respective diffuser connected to at least one of the vacuum/vent lines. The diffuser includes a tube connected in series with the line and having a plurality of radial through-holes, a case including a cylindrical support surrounding the tube as spaced from the tube, and a particulate filter extending along an inner surface of the case. The cylindrical support has a plurality of pores smaller than the holes in the tube. The filter, on the other hand, has a plurality of micro pores smaller than the pores of the support.
|
