发明名称 |
REFERENCE VALUE SETTING METHOD, PATTERN DETERMINING METHOD, ALIGNMENT TESTER, SEMICONDUCTOR APPARATUS MANUFACTURING SYSTEM, SEMICONDUCTOR MANUFACTURING FACTORY AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a reference value setting method and a pattern determining method, wherein even in the case of an underlying pattern having a substantially circular shaped part, it is possible to determine the pertinence of the position of a resist pattern for the underlying pattern accurately. SOLUTION: A metal wiring image is obtained as corresponding to a metal wiring having the substantially circular shaped part. After a real circle 108 is obtained in a shape approximate to the substantially circular shaped part 101a of the metal wiring image, a shortest straight distance 107 is obtained on an image between an ideal contact pattern image 106 corresponding to a contact pattern in designing of a resist to be formed corresponding to the metal wiring and the real circle 108. By use of this shortest straight distance 107, a reference value is decided for determining the pertinence of the position of a contact pattern corresponding to the metal wiring. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006086343(A) |
申请公布日期 |
2006.03.30 |
申请号 |
JP20040269718 |
申请日期 |
2004.09.16 |
申请人 |
SHARP CORP |
发明人 |
SHIOMI TAKESHI;SHIBATA AKIHIDE;NAKANO MASAYUKI |
分类号 |
H01L21/66;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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