发明名称 MEASURING SYSTEM USING ATTENUATED TOTAL REFLECTION
摘要 PROBLEM TO BE SOLVED: To provide a measuring system using attenuated total reflection for inhibiting degradation in measuring accuracy. SOLUTION: This measuring system uses attenuated total reflection comprises a chip connector unit 80 for connection measuring chips 9 equipped with a sample liquid holding section which holds sample liquid 11 on the surface of a thin-film layer formed on one side of a dielectric block, and a surface plasmon measuring device 101 which uses a dark line localizing section 29 to measure the dark line position in light beam totally reflected on the interface between the above dielectric block and the thin-film layer. The chip connector unit 80 is used to allow the light beam to enter the dielectric block so that the light beam is totally reflected on the interface through an incidence optical system 15, defoaming the sample liquid 11 by using a deaerator 60, before the sample liquid 11 is arranged on the surface of the thin-film layer. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006084412(A) 申请公布日期 2006.03.30
申请号 JP20040271599 申请日期 2004.09.17
申请人 FUJI PHOTO FILM CO LTD 发明人 MORI NOBUFUMI
分类号 G01N21/27 主分类号 G01N21/27
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