A METHOD FOR FORMING METAL CONTACT IN SEMICONDUCTOR DEVICE,申请号KR19990047728-传众专利搜索

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发明名称	A METHOD FOR FORMING METAL CONTACT IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100566310(B1)	申请公布日期	2006.03.30
申请号	KR19990047728	申请日期	1999.10.30
申请人		发明人
分类号	H01L21/336	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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