发明名称 Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium
摘要 Based on adjustment information on the adjustment unit under predetermined exposure conditions and information on the corresponding image-forming performance of the projection optical system, pattern correction information, information on a permissible range of the image-forming performance, and the like, a calculation step (steps 114 to 118 ) and a setting step (steps 120, 124, and 126 ) are repeatedly performed in the case an image-forming performance in at least one exposure apparatus is outside the permissible range under the target exposure conditions until the image-forming performance in all the exposure apparatus is within the permissible range. In the calculation step, an appropriate adjustment amount under target exposure conditions whose pattern is corrected is calculated for each exposure apparatus, and in the setting step, the correction information is set according to a predetermined criterion based on the image forming performance outside the permissible range, and when the image-forming performance in all the exposure apparatus is within the permissible range, the correction information that has been set is decided as the pattern correction information (step 138 ).
申请公布号 US2006068301(A1) 申请公布日期 2006.03.30
申请号 US20050250533 申请日期 2005.10.17
申请人 NIKON CORPORATION 发明人 HIRUKAWA SHIGERU
分类号 G03C5/00;G03F1/00;G03F7/20;G03F7/207;G06F17/50 主分类号 G03C5/00
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