发明名称 |
Removing apparatus, protective film forming apparatus, substrate processing system and removing method |
摘要 |
An application processing unit forms a cover film of a component soluble in an aqueous alkaline solution on the surface of a substrate formed with a resist film. The application processing unit can supply a developer used in a development processing unit as a remover for removing a cover film component adhering to the peripheral edge of the substrate. Thus, it is possible to selectively remove the cover film from the peripheral edge of the substrate without influencing the resist film.
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申请公布号 |
US2006067682(A1) |
申请公布日期 |
2006.03.30 |
申请号 |
US20050226750 |
申请日期 |
2005.09.14 |
申请人 |
DAINIPPON SCREEN MFG., CO., LTD. |
发明人 |
KANEYAMA KOJI;SHIGEMORI KAZUHITO |
分类号 |
G03D5/00 |
主分类号 |
G03D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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