| 摘要 |
A process and an arrangement are described by means of which a plurality of ray bundles emitted from individual radiation sources are combined with the aid of an imaging optics system. The individual radiation sources are in this connection arranged on at least one curve surrounding the optical axis of the imaging optics system. The individual ray bundles are substantially linearly polarised. The bundles are reflected on their path to the superimposition point at least at a surface whose reflection capability is polarisation-dependent. The polarisation direction of the ray bundles coming from the individual radiation sources is in this connection aligned so that the first reflection at the surface takes place with low loss, whereas a possible second reflection after previous reflection at the workpiece takes place with high loss. In this way the individual radiation sources are protected against damaging back-reflections.
|
