A method for creating a pattern on a substrate, the method includes the steps of imprinting a first pattern on the substrate; and imprinting a second substantially similar pattern which is mis-registered with regard to the first pattern so that the combination of the first and second patterns cause a systematic variation in a final size of defined elements across the substrate.
申请公布号
WO2005047976(A3)
申请公布日期
2006.03.30
申请号
WO2004US37354
申请日期
2004.11.09
申请人
EASTMAN KODAK COMPANY;FABINSKI, ROBERT, PIERRE;SUMMA, JOSEPH, R.