<p>Disclosed is a transparent conductive film which is excellent in crack resistance and adhesion to a base while maintaining high transparency and conductivity. Specifically disclosed is a transparent conductive film which is characterized in that low-density metal oxide layers and high-density metal oxide layers respectively composed of metal oxides are alternately arranged therein and it satisfies the condition defined by the formula (1) below when M1 represents the density in the low-density metal oxide layers and M2 represents the density in the high-density metal oxide layers. 1.01 = M2/M1 = 1.400</p>
