TREATMENT APPARATUS OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a treatment apparatus in which the undersurface of a substrate can be supported surely by a supporting roller when the substrate is treated while being inclined and conveyed. SOLUTION: This treatment apparatus is provided with: a plurality of treatment chambers 3-5 which are arranged side by side and each of which has the width narrower than that of the substrate and in each of which the predetermined treatment is performed on the substrate; a plurality of mounting members 11 each of which has the length shorter than the height of the substrate and some of which are arranged in each of treatment chambers parallel to one another at predetermined intervals in the vertical direction; the supporting roller 15 which is arranged to be rotated on each of mounting members and used for supporting the undersurface of the substrate to be sent into the corresponding treatment chamber while being inclined at a predetermined angle; and a driving roller 22 which is arranged to be rotary driven in each of treatment chambers for supporting the bottom end of the substrate, the undersurface of which is supported by the supporting roller, and is rotary driven to convey the substrate to the predetermined direction. COPYRIGHT: (C)2006,JPO&NCIPI