摘要 |
A maskless lithography system is described having a programmable mask to allow performing several lithographic steps using the same mask. In every lithographic step, the corresponding pattern is obtained by providing a digital pattern to the programmable mask. The programmable mask includes an array of pixels which are based on the electro-wetting principle. According to this principle, every pixel has a transparent reservoir containing a first, non-polar, non-transparent fluid and a second, polar, transparent fluid which are immiscible. Applying a field to the reservoir allows to displace the fluids with respect to each other. This allows to make the pixel either transparent or non-transparent. This lithographic programmable mask allows high resolution and fast setting and refreshing. A corresponding method for performing maskless optical lithography also is described. |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V.;DIRKSEN, PETER;HAYES, ROBERT, A.;JUFFERMANS, CASPARUS, A., H.;STEFFEN, THOMAS |
发明人 |
DIRKSEN, PETER;HAYES, ROBERT, A.;JUFFERMANS, CASPARUS, A., H.;STEFFEN, THOMAS |