发明名称 Lithographic apparatus, device manufacturing method and computer program product
摘要 Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.
申请公布号 US2006066828(A1) 申请公布日期 2006.03.30
申请号 US20040951028 申请日期 2004.09.28
申请人 ASML NETHERLANDS B.V. 发明人 KLERK JOHANNES W.D.
分类号 G03B27/42 主分类号 G03B27/42
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