发明名称 Production of nanoparticle platelets by PVD involves impacting a low temperature gas onto a multilayered intermediate to cause embrittlement and break up
摘要 <p>Production of nanoparticle platelets by PVD at better than 1 Pa vacuum of more than 10 layers with alternating separation agent layers comprises: (a) applying as liquid a 5-250 mu meltable organic gloss layer on a carrier turning on its axis; (b) applying the required layers; and (c) feeding a gas at less than -25[deg]C under pressure from one or more nozzles such that the gloss layer is embrittled and the multilayer coating is released as small particles. An independent claim is also included for apparatus for the process comprising a vapor deposition chamber, a side chamber for use in part of stage (c) and a vacuum-tight lock for use in stage (c), the apparatus operating such that a first carrier is introduced into the side chamber while a second carrier is simultaneously subjected to deposition in the vapor deposition chamber.</p>
申请公布号 DE102005001714(A1) 申请公布日期 2006.03.30
申请号 DE20051001714 申请日期 2005.01.13
申请人 WEINERT, HILMAR 发明人 WEINERT, HILMAR
分类号 B82B3/00;B82B1/00;C09C1/62;C09C3/00 主分类号 B82B3/00
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