| 摘要 |
<P>PROBLEM TO BE SOLVED: To make simpler the mechanism which monitors whether the quantity of light irradiated to a body to be drawn in an exposure apparatus is appropriate or not. <P>SOLUTION: The exposure apparatus 10 is provided with a base 11, a main body structure 20, and a stage 30. The stage 30 can be moved in two-dimensional directions on the base 11, and the main body structure 20 is formed in a gate type and provided on the base 11 to astride the stage 30. The main body structure 20 is provided with a projection optical system 22 which is positioned to emit the light made incident vertically to the system 22 perpendicularly to the stage 30. A planar reflection mirror 33 is provided on the stage 30 and fixed in an inclined state against the stage 30, and the main body structure 20 is provided with a light guide 24. The incident end 25 of the light guide is fixed to a position to which reflected light is made incident when the light emitted from the projection optical system 22 is made incident to the reflection mirror 33. In addition, a photometric means is installed to the emitting end of the light guide 24. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
