In immersion photolithography, immersion fluid (30) is located between a wafer (28) and a lens (24) for projecting an image on to the wafer (28) through the immersion fluid (30). In order to inhibit evaporation from the immersion fluid, a purge fluid saturated with a component of the immersion fluid is conveyed about the immersion fluid.
申请公布号
WO2006003373(A3)
申请公布日期
2006.03.30
申请号
WO2005GB02473
申请日期
2005.06.22
申请人
THE BOC GROUP PLC;GRANT, ROBERT, BRUCE;STOCKMAN, PAUL, ALAN