| 摘要 |
PROBLEM TO BE SOLVED: To improve yield and reliability in substrate processing by inspecting the rear surface of a substrate and removing the one with a flaw in advance, during a process, or before/after processing of the substrate. SOLUTION: The apparatus comprises a process chamber 16 for processing a substrate 7, a substrate holding device 15 for holding the substrate in the process chamber, a substrate transporting means 13 for transporting the substrate to the substrate holding device, and a rear surface inspecting device which inspects the rear surface of the substrate while the substrate transporting means transports the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
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