发明名称 LIGHTING APPARATUS, EXPOSURE APPARATUS AND MAICRODEVICE MANUFACTURING METHOD
摘要 <p>A lighting apparatus lights an irradiation plane (M) with irradiation light projected from a light source (2). The lighting apparatus is provided with reflecting fly-eye optical systems (12, 14), which are arranged between the light source (2) and the irradiation plane (M) and are composed of a plurality of reflecting partial optical systems for performing wavefront splitting to a luminous flux from the light source (2) for superimposition on the irradiation plane (M), and a reflecting optical system (10) arranged between the light source (2) and the reflecting fly-eye optical systems (12, 14) for guiding the irradiation light to the reflecting fly-eye optical systems (12, 14). At least one part of a reflecting plane of the optical system of the reflecting optical system (10) is composed of a diffusing plane.</p>
申请公布号 WO2006033336(A1) 申请公布日期 2006.03.30
申请号 WO2005JP17346 申请日期 2005.09.21
申请人 NIKON CORPORATION;KOMATSUDA, HIDEKI 发明人 KOMATSUDA, HIDEKI
分类号 H01L21/027;G02B17/00;G02B27/14;G02B27/18 主分类号 H01L21/027
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