Plasma impedance controlling device,申请号EP20020022826-传众专利搜索

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发明名称	Plasma impedance controlling device
摘要
申请公布号	EP1310979(A3)	申请公布日期	2006.03.29
申请号	EP20020022826	申请日期	2002.10.12
申请人	APPLIED FILMS GMBH & CO. KG	发明人	WILLMS, THOMAS, DIPL.-PHYS. DIPL.-ING.;BRUCH, JUERGEN, DIPL.-ING.
分类号	H01J37/32;H05H1/46;B01J3/00;B01J19/08;C23C14/34;H01J37/34	主分类号	H01J37/32
代理机构		代理人
主权项
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