发明名称 |
Vapor source for coating apparatus. |
摘要 |
<p>Apparatus for producing thin coatings by a vacuum process from two components of different vapor pressure comprises a sputtering system (2) for the component of lower vapor pressure and a heated tank (1, 5) of granules (3) of the component of higher vapor pressure. A massive steel block (6) is fitted above the tank with a central channel (8), in which a rotating cylindrical holder (7) is mounted, with a flat section, to which the substrate (4) to be coated is attached. This allows it to be exposed to temperatures of 300 - 600 [deg] C through the channel. The block has a wedge-shaped channel in its upper side, with the wider side facing outwards, through which the substrate can be exposed to the sputtering system as the holder rotates.</p> |
申请公布号 |
EP1640471(A2) |
申请公布日期 |
2006.03.29 |
申请号 |
EP20050011770 |
申请日期 |
2005.06.01 |
申请人 |
FORSCHUNGSZENTRUM KARLSRUHE GMBH |
发明人 |
GEERK, JOCHEN, DR.;RATZEL, FRITZ;SCHNEIDER, RUDOLF, DR. |
分类号 |
C23C14/00;C23C14/06;C23C14/22;C23C14/50 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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