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发明名称
PHOTORESIST LAYER-COATING POLYMER, NONIONIC PHOTO ACID GENERATOR, AND PHOTORESIST LAYER-COATING COMPOSITION INCLUDING THE SAME
摘要
申请公布号
KR20060028100(A)
申请公布日期
2006.03.29
申请号
KR20040077123
申请日期
2004.09.24
申请人
DONGJIN MOLECULAR DESIGN TECHNOLOGY
发明人
HWANG, SEOK HO;YOON, HEE KOO;LEE, CHUN HYUK
分类号
G03F7/027
主分类号
G03F7/027
代理机构
代理人
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