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发明名称
GAS EXHAUST APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要
申请公布号
KR20060028008(A)
申请公布日期
2006.03.29
申请号
KR20040076986
申请日期
2004.09.24
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
HAM, KYU HWAN
分类号
H01L21/02;H01L21/205
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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