发明名称 |
WASHING AND PRESERVING METHODS, METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING DEVICE, ELECTRO-OPTICAL APPARATUS, AND ELECTRONIC EQUIPMENT |
摘要 |
To provide a pattern formation method capable of forming a pattern by cleaning a liquid droplet ejection head without causing problems during the liquid droplet ejection operation, when the liquid droplet ejection head stored with a storage solution is used again, a pattern formation method includes: filling a passage including a liquid droplet ejection head and a conduit to feed a functional solution to the liquid droplet ejection head with purified water; filling the passage with a solvent dissolving both the purified water and a solvent contained in the functional solution, filling the passage with the solvent contained in the functional solution, surface treating a substrate by forming a lyophobic film on a region surrounding a pattern formation region defined on the substrate; and disposing liquid droplets on the pattern formation region with the liquid droplet ejection head. |
申请公布号 |
KR100564051(B1) |
申请公布日期 |
2006.03.29 |
申请号 |
KR20040025591 |
申请日期 |
2004.04.14 |
申请人 |
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发明人 |
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分类号 |
B41J2/01;B05D1/26;B05D3/10;B08B9/00;B08B9/02;B08B9/027;B41J2/175;G02F1/13;H01L21/288;H01L21/304;H01L21/768;H05K3/10 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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