发明名称 WASHING AND PRESERVING METHODS, METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING DEVICE, ELECTRO-OPTICAL APPARATUS, AND ELECTRONIC EQUIPMENT
摘要 To provide a pattern formation method capable of forming a pattern by cleaning a liquid droplet ejection head without causing problems during the liquid droplet ejection operation, when the liquid droplet ejection head stored with a storage solution is used again, a pattern formation method includes: filling a passage including a liquid droplet ejection head and a conduit to feed a functional solution to the liquid droplet ejection head with purified water; filling the passage with a solvent dissolving both the purified water and a solvent contained in the functional solution, filling the passage with the solvent contained in the functional solution, surface treating a substrate by forming a lyophobic film on a region surrounding a pattern formation region defined on the substrate; and disposing liquid droplets on the pattern formation region with the liquid droplet ejection head.
申请公布号 KR100564051(B1) 申请公布日期 2006.03.29
申请号 KR20040025591 申请日期 2004.04.14
申请人 发明人
分类号 B41J2/01;B05D1/26;B05D3/10;B08B9/00;B08B9/02;B08B9/027;B41J2/175;G02F1/13;H01L21/288;H01L21/304;H01L21/768;H05K3/10 主分类号 B41J2/01
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