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发明名称
Method for forming metal wiring layer of semiconductor device
摘要
申请公布号
KR100564605(B1)
申请公布日期
2006.03.28
申请号
KR20040002666
申请日期
2004.01.14
申请人
发明人
分类号
H01L21/28;H01L21/285;H01L21/768;H01L29/15
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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