发明名称 |
Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance |
摘要 |
The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
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申请公布号 |
US7019093(B2) |
申请公布日期 |
2006.03.28 |
申请号 |
US20020273540 |
申请日期 |
2002.10.18 |
申请人 |
DOW GLOBAL TECHNOLOGIES INC. |
发明人 |
SO YING HUNG;WATSON KEITH J.;BIS SCOTT J. |
分类号 |
C08F10/00;C08L45/00;G03F7/023;G03F7/40 |
主分类号 |
C08F10/00 |
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