发明名称 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
摘要 The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
申请公布号 US7019093(B2) 申请公布日期 2006.03.28
申请号 US20020273540 申请日期 2002.10.18
申请人 DOW GLOBAL TECHNOLOGIES INC. 发明人 SO YING HUNG;WATSON KEITH J.;BIS SCOTT J.
分类号 C08F10/00;C08L45/00;G03F7/023;G03F7/40 主分类号 C08F10/00
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