发明名称 |
Systems and methods for ion beam focusing |
摘要 |
Systems and methods are provided for focusing a scanned ion beam in an ion implanter. A beam focusing system is provided, comprising first and second magnets providing corresponding magnetic fields that cooperatively provide a magnetic focusing field having a time-varying focusing field center generally corresponding to a time-varying beam position of a scanned ion beam along a scan direction. Methods are presented, comprising providing a focusing field having a focusing field center in the scan plane, and dynamically adjusting the focusing field such that the focusing field center is generally coincident with a time-varying beam position of the scanned ion beam along the scan direction.
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申请公布号 |
US7019314(B1) |
申请公布日期 |
2006.03.28 |
申请号 |
US20040967855 |
申请日期 |
2004.10.18 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
BENVENISTE VICTOR M.;KELLERMAN PETER L. |
分类号 |
H01L21/324;H01J37/317;H01J49/30 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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