发明名称 |
Lithographic projection mask, device manufacturing method, and device manufactured thereby |
摘要 |
A method according to one embodiment of the invention may be used in determining relative positions of developed patterns on a substrate (exposed e.g. using the step mode). Such a method uses reference marks which are located within or even superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks that may be used in such a method.
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申请公布号 |
US7019814(B2) |
申请公布日期 |
2006.03.28 |
申请号 |
US20030738977 |
申请日期 |
2003.12.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BEST KEITH FRANK;CONSOLINI JOSEPH J.;FRIZ ALEXANDER |
分类号 |
G01B11/00;G03B27/42;G03B27/52;G03F9/00;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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