| 发明名称 |
Plasma processing apparatus |
| 摘要 |
A plasma processing apparatus comprises a plate that separates a high frequency induction antenna from a vacuum chamber. The plate comprises a nonmagnetic metal plate that has an opening and a dielectric material member that seals the opening. The area of the nonmagnetic metal plate is larger than the area of the dielectric material member.
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| 申请公布号 |
US7018506(B2) |
申请公布日期 |
2006.03.28 |
| 申请号 |
US20030458239 |
申请日期 |
2003.06.11 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HONGOH TOSHIAKI;MATSUMOTO NAOKI;KOSHIMIZU CHISHIO |
| 分类号 |
C23C16/00;H05H1/46;C23C16/507;C23C16/509;H01J37/32;H01L21/205;H01L21/306;H01L21/3065;H05H1/16 |
主分类号 |
C23C16/00 |
| 代理机构 |
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代理人 |
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