发明名称 |
Micromachined electromechanical device |
摘要 |
A method for fabricating a MEMS device comprises providing a substrate having a back side, a front side opposite to the back side and a periphery portion. A desired microstructure is formed on the back side of the substrate. The substrate is then supported for rotation. A precursor solution is deposited on the front side of the substrate during rotation so that a thin film layer may be formed thereon. During formation of the thin film layer, the substrate is supported and rotated that the microstructure formed on the back side is protected.
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申请公布号 |
US7018862(B2) |
申请公布日期 |
2006.03.28 |
申请号 |
US20030619923 |
申请日期 |
2003.07.15 |
申请人 |
AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
YAO KUI;HE XUJIANG;ZHANG JIAN;SHANNIGRAHI SANTIRANJAN |
分类号 |
B81C1/00;H01L21/46;B81B1/00;B81B3/00;H01L21/00;H01L41/08;H01L41/09;H01L41/18;H01L41/22;H01L41/24 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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