| 摘要 |
FIELD: practice of manufacture of microelectronic and micromechanical devices, applicable in manufacture of displacement transducers of moving media, gas analyzers of resistance thermometers etc. ^ SUBSTANCE: method includes deposition of a layer of polysilicon or a Langmuir layer of surface-active heat-resistant polymeric compound on the sensor bed surface, formation of the mask from the deposited layer, clearing of the free surface of the bed by the method of dry etching, application of catalytic metal at a bed temperature within 400 to 600°C at a ratio of thickness of the deposited layer to the metal thickness of not less than two, and formation of the components from the catalytic metals by the method of blast photolithography. Catalytic metal may be applied by the method of magnetron spraying. ^ EFFECT: improved adhesion of metals to the surface and obtain stable S-V characteristics of the MIMS structure provided enhanced reliability and durability of sensors. ^ 2 cl, 2 dwg |
