Fabricating method of semiconductor device,申请号KR20020086922-传众专利搜索

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发明名称	Fabricating method of semiconductor device
摘要
申请公布号	KR100564795(B1)	申请公布日期	2006.03.27
申请号	KR20020086922	申请日期	2002.12.30
申请人		发明人
分类号	H01L21/336;H01L21/265;H01L21/31;H01L21/3205;H01L21/469;H01L21/4763	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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