发明名称 METHODS OF FABRICATING INTERFEROMETRIC MODULATORS BY SELECTIVELY REMOVING A MATERIAL
摘要 Methods for making MEMS devices such as interferometric modulators invol ve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recesse d away from openings in a covering layer. These methods may be used to make unreleased and releas ed interferometric modulators.
申请公布号 CA2520374(A1) 申请公布日期 2006.03.27
申请号 CA20052520374 申请日期 2005.09.21
申请人 IDC, LLC 发明人 ARBUCKLE, BRIAN W.;TUNG, MING-HAU;FLOYD, PHILIP D.
分类号 G02F1/01;B81B7/02;G02B26/00;G02B26/08 主分类号 G02F1/01
代理机构 代理人
主权项
地址