发明名称 |
METHODS OF FABRICATING INTERFEROMETRIC MODULATORS BY SELECTIVELY REMOVING A MATERIAL |
摘要 |
Methods for making MEMS devices such as interferometric modulators invol ve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recesse d away from openings in a covering layer. These methods may be used to make unreleased and releas ed interferometric modulators.
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申请公布号 |
CA2520374(A1) |
申请公布日期 |
2006.03.27 |
申请号 |
CA20052520374 |
申请日期 |
2005.09.21 |
申请人 |
IDC, LLC |
发明人 |
ARBUCKLE, BRIAN W.;TUNG, MING-HAU;FLOYD, PHILIP D. |
分类号 |
G02F1/01;B81B7/02;G02B26/00;G02B26/08 |
主分类号 |
G02F1/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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