发明名称 |
Lithographic apparatus and device menufacturing method |
摘要 |
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
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申请公布号 |
US2006060799(A1) |
申请公布日期 |
2006.03.23 |
申请号 |
US20050263012 |
申请日期 |
2005.11.01 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRANKEN DOMINICUS JACOBUS P.A.;LOOPSTRA ERIK R.;BARTRAY PERTRUS R.;VAN DER WIJST MARC W.M.;RENKENS MICHAEL JOZEFA M.;VAN SCHOTHORST GERARD;DRIES JOHAN J. |
分类号 |
G21K5/10;F16F15/02;G03F7/20;H01L21/027 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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