| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce scattering of a liquid from a gap between the final surface of a projection optical system and a substrate in an exposure device in which a liquid immersion method is applied. <P>SOLUTION: The exposure device exposes a substrate through an original plate in the state that liquid is filled in the gap between the substrate and the final surface 4S of the projection optical system. The exposure device includes a substrate stage which holds and moves the substrate, a supply means which has a supply nozzle 5 and supplies the liquid to the gap between the substrate held by the substrate stage and the final surface through the supply nozzle, a recovery means having a recovery nozzle 6 and recovering the liquid filled in the gap through the recovery nozzle, a blow-out part 24 arranged at the exterior of the supply nozzle and the recovery nozzle relative to the projection optical system and blowing gas out to surround the liquid filled in the gap, and a recovering part arranged at the outside of the blow-out part relative to the projection optical system and recovering the gas blown out from the blow-out part. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
