发明名称 |
Thin film forming method and system |
摘要 |
A thin-film forming method, which includes the steps of: (1) holding at least one object in a chamber; (2) depositing a film-forming material on the object; (3) etching the forming material while depositing is conducted. In the present invention, the depositing and etching are controlled to simultaneously conduct. The invention also disclose a system for performing the method.
|
申请公布号 |
US2006060559(A1) |
申请公布日期 |
2006.03.23 |
申请号 |
US20040945873 |
申请日期 |
2004.09.22 |
申请人 |
SAE MAGNETICS (H.K.) LTD. |
发明人 |
FANG HONGXIN;MA HONGTAO;ZHANG BAIQING;CHEN BAOHUA;CHOUDHURY SOMEN |
分类号 |
B44C1/22;C23C16/00;C23F1/00 |
主分类号 |
B44C1/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|