发明名称 |
Novel photosensitive resin compositions |
摘要 |
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
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申请公布号 |
US2006063095(A9) |
申请公布日期 |
2006.03.23 |
申请号 |
US20040966349 |
申请日期 |
2004.10.15 |
申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
NAIINI AHMAD A.;HOPLA RICHARD;POWELL DAVID B.;METIVIER JON;RUSHKIN IL'YA |
分类号 |
G03C5/18;G03F;G03F7/022;G03F7/023 |
主分类号 |
G03C5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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