发明名称 |
SEMICONDUCTOR WAFER SUPPORTING PLATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor wafer supporting plate and a method for manufacturing the semiconductor device capable of easily and satisfactorily conducting a process such as a plating process of a through-hole portion of a semiconductor wafer, and capable of manufacturing a satisfactory semiconductor device with a good manufacturing efficiency. SOLUTION: The semiconductor wafer supporting plate 1 is formed in an approximately circular plate from a glass or a resin capable of transmititng an ultraviolet light with its outer diameter larger than that of the semiconductor wafer 10 supported by the plate 1. A plurality of openings 2 are formed in the semiconductor wafer supporting plate 1 corresponding to a plurality of through-holes 11 formed in the semiconductor wafer 10. The opening areas of these openings 2 are larger than that of the through-holes 11, that is, the opening diameters are set larger. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006080398(A) |
申请公布日期 |
2006.03.23 |
申请号 |
JP20040264730 |
申请日期 |
2004.09.10 |
申请人 |
TOSHIBA CORP |
发明人 |
HARADA SUSUMU;TAKUBO TOMOAKI;TAKAHASHI KENJI;AOKI HIDEO;NUMATA HIDEO;KANEKO HISAFUMI;EZAWA HIROKAZU;MATSUO MIE;IKEGAMI HIROSHI;OMURA ICHIRO |
分类号 |
H01L21/683;C25D7/12;C25D17/06;H01L21/288;H01L21/3205;H01L23/12;H01L23/52;H01L25/065;H01L25/07;H01L25/18 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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