发明名称 Field effect transistor and method of manufacturing the same
摘要 A field effect transistor according to one embodiment of the present invention is a field effect transistor which is supposed to be operated under a temperature condition at 300 K or less, comprising: an n-channel field effect transistor having a gate electrode formed by a gate electrode material having a work function WFn of less than 4.05. A field effect transistor according to one embodiment of the present invention is a field effect transistor which is supposed to be operated under a temperature condition at 300 K or less, comprising: a p-channel field effect transistor having a gate electrode formed by a gate electrode material having a work function WFp of more than 5.17.
申请公布号 US2006063314(A1) 申请公布日期 2006.03.23
申请号 US20050203402 申请日期 2005.08.15
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HOKAZONO AKIRA
分类号 H01L21/8232 主分类号 H01L21/8232
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