发明名称 Embedded capacitor structure in circuit board and method for fabricating the same
摘要 An embedded capacitor structure in a circuit board and a method for fabricating the same are proposed. The circuit board is formed with a first circuit layer on at least one surface thereof, wherein the first circuit layer has at least one first electrode plate for the capacitor structure. Then, a dielectric layer is formed on the first circuit layer and made flush with the first circuit layer. The dielectric layer has a relatively low dielectric constant and good fluidity to effectively fill the spaces between patterned traces of the first circuit later. A capacitive material is deposited on the dielectric layer and the first circuit layer. Finally, a second circuit layer is formed on the capacitive material and has at least one second electrode plate corresponding to the first electrode plate, together with the capacitive material disposed in-between, to form the capacitor structure.
申请公布号 US2006063325(A1) 申请公布日期 2006.03.23
申请号 US20050264999 申请日期 2005.11.01
申请人 CHANG RUEI-CHIH 发明人 CHANG RUEI-CHIH
分类号 H01L21/8242;H01L23/498;H05K1/03;H05K1/16;H05K3/46 主分类号 H01L21/8242
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